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This achievement marks a new step forward in China's homegrown chip development. Amid major trade restrictions enforced by the United States, SMIC's new generation foundry node is said to be comparable to the 7nm process by Taiwan Semiconductor Manufacturing Company (TSMC), the world's largest dedicated independent semiconductor foundry. As China's largest chip foundry, SMIC will introduce its N+1 7nm node, marking a significant improvement over its current 14 top article nm production node, boasting a 20% increase in performance, power consumption reduction of 57%, a reduced logic area of 63%, and SoC (System on a Chip) area reduction of 55%, according to the company. Moreover, the N+1 foundry node may enable SMIC to break its reliance on advanced Extreme Ultraviolet (EUV) lithography machines produced by Dutch microchip machine maker ASML, according to Liang Mengsong, co-CEO of SMIC. ASML is subject to U.S. export controls as its products contain American technology. At the same time, China is working hard to develop its own lithography system. The Suzhou Institute of Nano-tech and Nano-Bionics under the Chinese Academy of Sciences (Sinano), along with the National Center for Nanoscience and Technology, recently announced a breakthrough in a new type of 5nm laser lithography technology. Experts believe it could lay the foundation for research into a self-developed advanced lithography machine. The new technology has broken the traditional constraint in laser direct writing (LDW) with its ability to process at the nano level. In addition to ultra-high precision, the technology also demonstrates potential for mass production.

https://www.prnewswire.com/il/news-releases/china-moves-closer-to-self-reliance-in-7nm-chip-production-822983467.html

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